The design of EUV lasers is already completely absurd. It's an awesome piece of engineering, but it's no easier to push the laser wavelength downwards than anything else.
Does the lithography require the tight wavelength or other nice properties of lasers? I had thought they used filtered synchrotron output since a while ago.
Basically everything about the process is absurd, not sure why pushing on the light source is less feasible then any of the other knobs
Diffraction limit becomes a real problem at these feature sizes even with short wavelength light, and the physical properties of short wavelength light start to damage equipment and cause serious other issues even at the current levels.
At some point it’s switching from ‘lots of wiffle balls in a stream’ to ‘high power machine gun fire’, and the physical properties of everything involved become very limiting.
